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Gallium nitride (GaN) single crystal is a wide-bandgap semiconductor material. Gallium nitrid has broad application prospects in optoelectronic devices, it used as an insulating layer for Ga-based semiconductor materials, and as an ultraviolet filter.
It has application prospects in the fields of ultraviolet detectors, gas sensors, light-emitting diodes (LEDs) and. Expecially, Gallium nitride substrates are matched in lattice constant and thermal expansion properties for epitaxial growth of doped GaN layers needed for fabrication of GaN-based devices. This eliminates stress and defects induced by growing GaN epi-layers on non-nitride substrates such as sapphire or silicon carbide, which increase device fabrication complexity and cost and compromise device performance.
GaN Properties | |
Refractive Index | 2.67 |
Density | 6.095 g/cm3 |
Thermal Conductivity | 1.3-2.3W/(cm·K) |
Debye Temperature | 600K |
Linear Thermal Expansion Coeff. | Along a0: 5.59×10-6 K/ Along c0: 7.75×10-6 K-1 |
Lattice Parameter | a0 = 0.3189 nm/ c0 = 0.5185 nm |
Density | 6.095 g·cm-3 |
Crystal structure | Wurtzite |
Band gap | 3.4eV |
Size | 2inch | 4inch |
Conduction Type | n-Type | |
Carrier Concentration(cm-3) | ≧1×1018 | ≧1×10 |
Mobility(cm2/V·sec) | ≧80 | ≧80 |
Diameter(nm) | 50.0±0.5 | 100.0±0.5 |
Thickness(μm) | 400±30 | 400±50 |
Orientation | (0001)±1.0° | (0001)±1.0° |
Surface Finish | P/LE | |
TTV(μm) | ≦20 | ≦20 |
Warp(μm) | ≦30 | ≦50 |
Package | Individual Container |
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